1. A process used to produce a thin layer of silicon dioxide on the surface of a semi-conductor wafer of silicon. The high-temperature process causes the oxidizing agent to diffuse into the wafer. Using temperatures of up to 1,200^ºC, water or oxygen reacts with the silicon to form silicon dioxide as either wet oxidation or dry oxidation, respectively.

2. A high-temperature process involving the oxidizing of combustible materials by above the auto-ignition temperature in the presence of oxygen, reducing them to carbon dioxide and water.