A technique in nanofabrication using a subtractive approach based on photolithography, electron-beam lithography, and focused ion beam lithography that is being developed for the microelectronics industry. The required feature sizes in nanodevices, magnetic recording, and spintronic devices are achieved through the etching or removal of material from a larger construct. The current minimum feature size using the conventional processes of growth, deposition, lithography, and etching is about 10 nm. For mass production of nano-scale structures, nanoimprint lithography is emerging as a powerful top-down nanofabrication technique.