“plasma etching”的概念、定义、翻译、参考文献-科学参考

单词	plasma etching
释义	plasma etching [`plaz·mǝ `ech·iŋ] ^ELECTRONICS A method of forming integrated-circuit patterns on a surface, in which charged species in a plasma formed above a masked surface are directed to impact the nonmasked regions of the surface and knock out substrate atoms. Also known as dry plasma etching.
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