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单词 electron-beam lithography
释义 electron-beam lithography
[i`lek´trän ´bēm li`thäg·rǝ·fē]
ELECTRONICS
Lithography in which the radiation- sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control; after exposure, the film is removed from the vacuum chamber for conventional development and other production processes.
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