“electron-beam lithography”的概念、定义、翻译、参考文献-科学参考

单词	electron-beam lithography
释义	electron-beam lithography [i`lek´trän ´bēm li`thäg·rǝ·fē] ^ELECTRONICS Lithography in which the radiation- sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control; after exposure, the film is removed from the vacuum chamber for conventional development and other production processes.
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