“direct current sputtering”的概念、定义、翻译、参考文献-科学参考

direct current sputtering

Encyclopedia

工学表面技术释
direct current sputtering直流溅射
在真空环境中将阴阳两电极之间加上一定的电压，气体就会发生自激放电，从阴极发射出的原子或原子团可沉积在阳极或真空室的壁上从而沉积成薄膜的技术。又称阴极溅射、二极溅射。
工学表面技术释
direct current sputtering射频溅射
利用射频放电等离子体中的正离子轰击靶材，溅射出的靶材原子沉积在接地的基板表面从而形成薄膜的技术。

单词	direct current sputtering
释义	direct current sputtering Encyclopedia 工学表面技术释 direct current sputtering直流溅射在真空环境中将阴阳两电极之间加上一定的电压，气体就会发生自激放电，从阴极发射出的原子或原子团可沉积在阳极或真空室的壁上从而沉积成薄膜的技术。又称阴极溅射、二极溅射。工学表面技术释 direct current sputtering射频溅射利用射频放电等离子体中的正离子轰击靶材，溅射出的靶材原子沉积在接地的基板表面从而形成薄膜的技术。
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