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钽靶材
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钽靶材
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钽
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tantalum target
钽靶材
通过磁控溅射等物理气相沉积法或其他镀膜方法在适当工艺条件下溅射在基板上形成各种功能薄膜的溅射源。是钽薄膜制备过程中高速荷能粒子轰击的目标钽材料。
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typical events of electronic commerce
typical fiber
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typicality
typicality in literature
typical links of control systems
typically real function
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typical scenery planning
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typical spiral galaxy
typical star
typical steppe ecosystem
typical stroke
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typical system of force
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