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plasma sputtering
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plasma sputtering
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半导体薄膜制备
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plasma sputtering
等离子体溅射
利用真空室中的稀有气体通过辉光放电产生的等离子体轰击靶材,使其原子溅射出来,落在镀件表面形成薄膜的物理气相淀积技术。
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