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metal organic chemical vapor deposition
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metal organic chemical vapor deposition
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metal organic chemical vapor deposition
金属有机物化学气相沉积
1968年为解决制备化合物半导体薄膜单晶的难题而提出的一项新技术。简写为MOCVD。
Chemistry
>无机化学>固体化学>释义
metal organic chemical vapor deposition (MOCVD)
金属有机气相沉积
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