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focused ion beam lithography
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focused ion beam lithography
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focused ion beam lithography
聚焦离子束光刻
在聚焦离子束技术基础上将原子离化后形成离子束的能量控制在10~200千电子伏特,在工件表面采用直接扫描、掩模曝光或者投影曝光加工微细线条图案,制备微纳器件的工艺。
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